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Clean garments become contaminated in the course of the gowning/ungowning procedure, common use, and because of significant targeted visitors in the gowning place. The contamination dilemma is amplified in the event the exact same garment is worn quite a few periods or is taken on and off several instances during the day. Not all production environments call for demanding particle control, but the production of hugely sensitive solutions, for example radar programs, sensors, and Laptop or computer hardware has to be accom
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