https://www.selleckchem.com/products/sel120.html
The bubble moving distance required for the full deposition of a continuous and stable thin-liquid film is affected by the liquid viscosity and network branch angle. The liquid with a higher viscosity will increase the pressure drop for removing dry bubbles from microfluidic networks, while this effect will be hampered by increasing the microfluidic network complexity. The deposition of the thin-liquid film surrounding bubbles significantly decreases the pressure drop required to remove bubbles from microfluidics. Compared with deionized
Mi piace
Commento
Condividi
