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The effect of magnetic fields
The unevenness of the magnetic field will make the uniformity of the film worse. The basic principle of magnetron sputtering is to extend the trajectory of electrons through the magnetic field, and collide with argon atoms as much as possible. In the place where the magnetic field is strong, more Ar+ ions are generated and bombardment There are more atoms of the target material, and the film layer on the substrate is thicker. On the contrary, where the magnetic field is weak, the film layer is thinner. Obviously, the strength of the magnetic field will also affect the deposition rate, the deposition rate is high when the magnetic field is strong, and vice versa, the deposition rate is low.
Influence of substrate temperature and cleanliness
Appropriate substrate temperature can improve the adhesion and deposition speed of the film, which requires exploring the specific temperature according to different targets. The cleanliness of the substrate has a great influence on the adhesion between the substrate and the film, so it is very important to do a good job of cleaning the substrate and the vacuum chamber.
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